Enhanced dispersion and the reactivity of atomically thin Rh layers supported by molybdenum oxide films
The behavior of rhodium layers deposited on oxidized, 0.15-20.0 ML thick Mo films formed on a nearly stoichiometric TiO<inf>2</inf>(110) single crystal was characterized by AES, TPD and work function (WF) measurements. The oxidation of 0.15-2.7 ML thick Mo deposits was performed via the...
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| Format: | Article |
| Published: |
Elsevier
2015
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| Series: | SURFACE SCIENCE
641 |
| doi: | 10.1016/j.susc.2015.05.008 |
| mtmt: | 2958256 |
| Online Access: | http://publicatio.bibl.u-szeged.hu/9849 |